文献
J-GLOBAL ID:201702257022784481
整理番号:17A0085380
シリコン上のAlGaN/GaN高電子移動度トランジスターにおけるバッファー誘導・時間依存性・OFF状態・漏えい
Buffer-Induced Time-Dependent OFF-State Leakage in AlGaN/GaN High Electron Mobility Transistors on Silicon
著者 (10件):
Tao Ming
(Institute of Microelectronics, Peking University, Beijing, China)
,
Wang Maojun
(Institute of Microelectronics, Peking University, Beijing, China)
,
Liu Shaofei
(Institute of Microelectronics, Peking University, Beijing, China)
,
Xie Bing
(Institute of Microelectronics, Peking University, Beijing, China)
,
Yu Min
(Institute of Microelectronics, Peking University, Beijing, China)
,
Wen Cheng P.
(Institute of Microelectronics, Peking University, Beijing, China)
,
Wang Jinyan
(Institute of Microelectronics, Peking University, Beijing, China)
,
Hao Yilong
(Institute of Microelectronics, Peking University, Beijing, China)
,
Wu Wengang
(Institute of Microelectronics, Peking University, Beijing, China)
,
Shen Bo
(Department of Physics, Peking University, Beijing, China)
資料名:
IEEE Transactions on Electron Devices
(IEEE Transactions on Electron Devices)
巻:
63
号:
12
ページ:
4860-4864
発行年:
2016年
JST資料番号:
C0222A
ISSN:
0018-9383
CODEN:
IETDAI
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)