Seino Yutaka

セイノユタカ | Seino Yutaka

Affiliation and department：
Homepage URL (1)： http://www.aist.go.jp/RESEARCHERDB/cgi-bin/worker_detail.cgi?call=namae&rw_id=Y24554416

Research field (1)： Metallic materials

MISC (10)：

Y Shioya, H Shimoda, K Maeda, T Ohdaira, R Suzuki, Y Seino. Low-k SiOCH film deposited by plasma-enhanced chemical vapor deposition using hexamethyldisiloxane and water vapor. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. 2005. 44. 6A. 3879-3884
S Takada, N Hata, Y Seino, N Fujii, T Kikkawa. Skeletal silica characterization in porous-silica low-dielectric-constant films by infrared spectroscopic ellipsometry. JOURNAL OF APPLIED PHYSICS. 2005. 97. 11. 113504-113508
Theoretical Investigation of the Dielectric Constant and Elastic Modulus of Three-Dimensional Isotropic Porous Silica Films with Cubic and Disordered Pore Arrangements. JAPANESE JOURNAL OF APPLIED PHYSICS. 2005. 44. 8. 5982-5986
S Takada, N Hata, Y Seino, K Yamada, Y Oku, T Kikkawa. Mechanical property and network structure of porous silica films. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS. 2004. 43. 5A. 2453-2456
Ultra-low-k Mesoporous Silica Films Fromed by Using Nonionic Surfactant Templates. JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 2004. 151. 10. F248-F251

ｍore...

Professional career (1)：

理学博士

Association Membership(s) (5)：

USA , The Materials Research Society , The Society of Materials Science, Japan , Material Testing Research Association of Japan , The Japan Society for Precision Engineering

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