Rchr
J-GLOBAL ID：200901016700332472
Update date: Jun. 05, 2007
MANIRUZZAMAN MD
MD マニルシャン | MANIRUZZAMAN MD
Affiliation and department：
Job title：
Semiconductor Materials Processings For Si-ULSI Device Interconnections or Metallization Technology
Homepage URL (1)：
http://www.geocities.com/mdm_zaman/home.html
Research field (2)：
Electric/electronic material engineering
, Thin-film surfaces and interfaces
Research keywords (3)：
Thin Film
, Diffusion Barrier
, Copper Metallization
Research theme for competitive and other funds (2)：
- 2001 - 2006 Formation of Cu[111] layer on Nb-based diffusion barrier on field oxide layer of SiO2.
- -
Education (3)：
- - 2006 Kitami Institute of Technology Graduate School, Division of Materials Science Semiconductor Materials Processings (Barrier Layer Technology for Si-ULSI Metallization Technology)
- - 2003 Kitami Institute of Technology Graduate School, Division of Engineering Electronic/Semiconductor physics(Barrier Layer Technology for Si-ULSI Metallization Technology)
- - 1997 Bangladesh University of Engineering and Technology Electrical and Electronics Engineering Electrical and Electronics Engineering
Professional career (1)：
- Masters (Kitami Institute of Technology)
Work history (1)：
- 1997 - -till now, Lecturer, Electronics and Communication Engineering Discipline, Khulna University, Bangladesh
Committee career (1)：
- 2003 - 2004 The Institute of Electronics, Information and Communication Engineers Student Member
Association Membership(s) (2)：
Information and Communication Engineers
, The Institute of Electronics
