Rchr
J-GLOBAL ID：200901016881814279
Update date: May. 02, 2020
Ofuji Masato
オオフジ マサト | Ofuji Masato
Affiliation and department：
Job title：
Graduate student(doctorate program)
Research theme for competitive and other funds (2)：
MISC (4)：
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M Ofuji, K Inaba, K Omote, H Hoshi, Y Takanishi, K Ishikawa, H Takezoe. Growth process of vacuum deposited copper phthalocyanine thin films on rubbing-treated substrates. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS. 2003. 42. 12. 7520-7524
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M Ofuji, K Inaba, K Omote, H Hoshi, Y Takanishi, K Ishikawa, H Takezoe. Growth process of vacuum deposited copper phthalocyanine thin films on rubbing-treated substrates. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS. 2003. 42. 12. 7520-7524
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M Ofuji, K Inaba, K Omote, H Hoshi, Y Takanishi, K Ishikawa, H Takezoe. Grazing incidence in-plane X-ray diffraction study on oriented copper phthalocyanine thin films. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS. 2002. 41. 8. 5467-5471
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M Ofuji, K Inaba, K Omote, H Hoshi, Y Takanishi, K Ishikawa, H Takezoe. Grazing incidence in-plane X-ray diffraction study on oriented copper phthalocyanine thin films. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS. 2002. 41. 8. 5467-5471
Education (4)：
- - 2002 Tokyo Institute of Technology Science of Engineering Organic and Polymer Chemistry
- - 2002 Tokyo Institute of Technology Graduate School, Division of Science and Engineering
- - 2000 Tokyo Institute of Technology School of Engineering Dept. of Organic and Polymeric Materials
- - 2000 Tokyo Institute of Technology Faculty of Engineering
Professional career (1)：
Work history (1)：
- 2003 - 21世紀COEプログラム「産業化を目指したナノ材料開拓と人材育成」 リサーチアシスタント 2003 -
Association Membership(s) (2)：
応用物理学会
, Japan Society of Applied Physics
