Rchr
J-GLOBAL ID:200901020479110114   Update date: Feb. 01, 2024

Seki Toshio

セキ トシオ | Seki Toshio
Affiliation and department:
Other affiliations (1):
Homepage URL  (2): https://www.ne.t.kyoto-u.ac.jp/ja/research/introduction/q_beamhttps://www.ne.t.kyoto-u.ac.jp/en/research/introduction/q_beam?set_language=en
Research field  (5): Quantum beam science ,  Material fabrication and microstructure control ,  Applied physics - general ,  Thin-film surfaces and interfaces ,  Nanostructure chemistry
Research keywords  (7): SIMS ,  クラスター ,  量子ビーム科学 ,  ナノ構造材料 ,  ノズル ,  nano-processing ,  cluster ion beam
Research theme for competitive and other funds  (7):
  • 2017 - 2021 Ambient SIMS Technique for Liquid-Solid Interface Analysis
  • 2015 - 2018 Development of surface process technology with high speed and no damage by huge composite cluster
  • 2014 - 2016 高反応性中性クラスタービームによる微細パターンエッチング
  • 2011 - 2014 Development of analytical technique for organic materials with massive cluster ion beams
  • 2010 - 2012 Development of Nano-scale structure design and process technology by advanced composite cluster beam
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Papers (150):
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MISC (80):
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Patents (24):
Books (2):
  • New practical vacuum technology
    2019 ISBN:9784860435592
  • クラスターイオンビーム基礎と応用
    日刊工業新聞社 2006
Lectures and oral presentations  (259):
  • Ambient Secondary Ion Mass Analysis with MeV-energy Heavy Ion
    (11th International Symposium on Atomic Level Characterizations for New Materials and Devices ’17 (ALC`17) 2017)
  • Fabrication of 3D structure by double-angled etching with reactive gas cluster injection
    (The 39th International Symposium on Dry Process(DPS2017) 2017)
  • Characterization of Bio-Molecules with GCIBSIMS equipped with MS/MS Spectrometer
    (AVS 64th International Symposium & Exhibition 2017 (AVS64) 2017)
  • Organic Material Analysis with a SIMS System with Q-TOF MS/MS Technique
    (The 8th International Symposium on Surface Science (ISSS-8) 2017)
  • Ambient SIMS using MeV-Energy Heavy Ion
    (The 23rd International Conference on Ion Beam Analysis (IBA-2017) 2017)
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Education (3):
  • 1997 - 2000 Kyoto University Graduate School of Engineering Deprtment of Electronic Science and Engineering
  • 1995 - 1997 Kyoto University Graduate School of Engineering Deprtment of Electronic Science and Engineering
  • 1991 - 1995 Kyoto University Faculty of Engineering School of Electrical & Electronic Engineering
Professional career (1):
  • Doctor(Engineering) (Kyoto University)
Work history (4):
  • 2007/05 - 現在 京都大学 大学院 工学研究科 原子核工学専攻 兼 附属情報センター 講師
  • 2005/06 - 2007/04 Kyoto University Quantum Science and Engineering Center, Graduate School of Engineering
  • 2003/04 - 2005/05 財団法人大阪科学技術センター 技術・情報振興部 研究員
  • 2000 - 2003 Kyoto University Graduate School of Engineering
Committee career (13):
  • 2020/04 - 現在 SISS実行委員会 委員
  • 2020/04 - 現在 応用物理学会 学術講演会プログラム編集委員
  • 2020/10 - 2024/09 IBA-2021,PIXE-2021合同国際会議 実行委員
  • 2023/02 - 2023/12 第44回ドライプロセス国際シンポジウム組織委員会 プログラム委員
  • 2022/02 - 2023/10 The 14th International Symposium on Atomic Level Characterizarions for New Materials and Devices (ALC’22) Program Committee
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Awards (2):
  • 2016/11 - The 38th International Symposium on Dry Process (DPS2016) Best Presentation Award
  • 1998 - Best Student Award of Ion Implantation Technology Conference
Association Membership(s) (1):
Japan Society of Applied Physics
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