Rchr
J-GLOBAL ID：200901024647947586
Update date: Dec. 08, 2004
Hoshikawa Kiyoshi
ホシカワ キヨシ | Hoshikawa Kiyoshi
Affiliation and department：
Research keywords (2)：
薄膜の作製技術
, thin film forming technology
Research theme for competitive and other funds (2)：
- 薄膜の作製及びデバイスの開発、X線による応力計測に関する研究
- Thin film formation and device development Study on measurement of stress by X ray
Professional career (1)：
Association Membership(s) (1)：
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