Rchr
J-GLOBAL ID：200901026169127554
Update date: Aug. 26, 2020
Yoshitake Masaaki
ヨシタケ マサアキ | Yoshitake Masaaki
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Affiliation and department：
Technology Research Institute of Osaka Prefecture Materials Technology Dept.
About Technology Research Institute of Osaka Prefecture Materials Technology Dept.
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Job title：
Deputy Director
Homepage URL (1)：
http://www.tri.pref.osaka.jp/
Research field (1)：
Electric/electronic material engineering
Research keywords (6)：
真空
, センサデバイス
, 薄膜
, Vacuum
, Sensor device
, Thin films
Research theme for competitive and other funds (4)：
2001 - 2002 温度補償素子集積型特殊環境用圧力センサの開発と実用化の研究
2000 - 2002 金属酸化物、窒化物、炭化物薄膜の作製とその応用
2000 - 2002 preparation of metal oxide, metal nitride and metal
carbide thin films and their application.
MISC (10)：
Masaaki Yoshitake, Toshikazu Nosaka, Akio Okamoto, Soichi Ogawa. The use of the ion beam current as a process control in the reactive sputtering of zirconium oxide. Thin Solid Films. 1993. 230. 1. 48-54
Masaaki Yoshitake, Toshikazu Nosaka, Akio Okamoto, Soichi Ogawa. The use of the ion beam current as a process control in the reactive sputtering of zirconium oxide. Thin Solid Films. 1993. 230. 1. 48-54
Synthesis of Zr-N film by reactive ion beam sputtering. Jpn.J.Appl.Phys. 29 (1990) 2800-2808
Effects on nitrogen pressure and RF power on the properties of reactive magnetron sputtered Zr-N and Application to a thermistor. Jpn.J.Appl.Phys. 31 (1992) 4002-4009
Effects of ion species on reactive ion beamsputtered Zr-N films. Jpn.J.Appl.Phys. 32 (1993) L113-115
ｍore...
Education (3)：
- 1974 Osaka Prefecture University
- 1974 Osaka Prefectural University Electronics
- 1972 Osaka Prefecture University School of Engineering
Professional career (1)：
Dr.degree (Osaka Prefecture University)
Work history (1)：
1976 - :大阪府立工業技術研究所(現産業技術総合研究所)入所
Association Membership(s) (4)：
日本真空協会
, 応用物理学会
, Vacuum Society of Japan
, Japan Society of Applied Physics
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