Rchr
J-GLOBAL ID:200901034390327757   Update date: Jan. 30, 2024

Kobayashi Shinichi

コバヤシ シンイチ | Kobayashi Shinichi
Affiliation and department:
Job title: Professor
Homepage URL  (1): http://www.t-kougei.ac.jp/engineering/index.html
Research field  (3): Electric/electronic material engineering ,  Crystal engineering ,  Applied materials
Research keywords  (4): 半導体の基礎物性 ,  半導体プラズマプロセス ,  Physics of Semiconductors ,  Plasma Processing of Semiconductors
Research theme for competitive and other funds  (5):
  • 2000 - 2002 Fabrication of high performance nano-crystalline germanium films using ultra-clean ECR plasma CVD
  • 1998 - 1999 次世代超LSI用材料Si/Ge薄膜の成長に関する研究
  • 1997 - 1998 次世代超LSI材料SiGeを拡散源としたSi中への不純物拡散の研究
  • 高品質アモルファス及び微結晶Ge膜の成膜と膜質評価
  • Deposition and Characterization of High-quality Amorphous and microcrystalline Ge Films
Papers (21):
more...
MISC (1):
Works (2):
  • CVD法によるSiGe系薄膜の形成とその応用
    1995 -
  • Deposition of SiGe films using CVD and its application
    1995 -
Education (3):
  • - 2003 Tohoku University
  • - 1990 Tohoku University
  • - 1988 Tohoku University Faculty of Engineering
Professional career (1):
  • Doctor (Tohoku University)
Association Membership(s) (2):
Materials Research Society ,  応用物理学会
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