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J-GLOBAL ID:200901040320057841   Update date: Jan. 30, 2024

Enta Yoshiharu

エンタ ヨシハル | Enta Yoshiharu
Affiliation and department:
Homepage URL  (1): http://www.st.hirosaki-u.ac.jp/~enta
Research field  (4): Thin-film surfaces and interfaces ,  Crystal engineering ,  Applied materials ,  Semiconductors, optical and atomic physics
Research theme for competitive and other funds  (24):
  • 2020 - 2024 将来の革新デバイスに向けたBi・Sn媒介GeSnナノドット形成技術の研究
  • 2019 - 2022 Quantum-dots formation in a buried interface by external-electron-energy injection
  • 2017 - 2020 Semimetal (metal) mediated group-IV-semiconductor nanostructure formation and its application for next-generation fundamental device technologies
  • 2015 - 2018 Formation and reaction control of silicon nanostructures by vacuum thermal decomposition
  • 2009 - 2011 Reaction mechanism of nano-scale silicon-insulator thin films by real-time observation
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Papers (60):
more...
MISC (61):
Education (4):
  • - 1991 Tohoku University
  • - 1991 Tohoku University Graduate School, Division of Natural Science
  • - 1986 Tohoku University Faculty of Science
  • - 1986 Tohoku University Faculty of Science
Professional career (1):
  • (BLANK) (Tohoku University)
Work history (2):
  • 1991 - 1999 Tohoku University
  • 1991 - 1999 Tohoku University, Research Associate
Association Membership(s) (3):
放射光学会 ,  応用物理学会 ,  日本物理学会
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