Rchr
J-GLOBAL ID：200901041853829478
Update date: Jan. 31, 2024
Shimizu Masaru
シミズ マサル | Shimizu Masaru
Affiliation and department：
Job title：
Professor
Homepage URL (1)：
http://www.u-hyogo.ac.jp/eng
Research field (1)：
Electric/electronic material engineering
Research keywords (7)：
ferroelectrics
, 電子物性
, 誘電体
, 薄膜
, Electronic Science
, Dielectrics
, Thin Film
Research theme for competitive and other funds (31)：
- 2013 - 2015 Fabrication of Ferroelectric Nanorod Capacitors for Ultrahigh Integrated FeRAMs
- 2012 - 2014 Spontaneous polarization in nanosized ferroelectrics and its size dependence
- 2010 - 2012 FABRICATION OF FERROELCTRIC ONE-DIMENSIONAL NANOSTRUCTURES AND CREATION OF FUNCTIONS
- 2010 - 2011 Preparation of composition-and valence-controlled BiFeO_3 thin films and investigation of leakage mechanism
- 2005 - 2006 Study on the Fabrication of Ferroelectric Ultrathin Films and Nanostructures by MOCVD and Their Size Effects
- 2004 - 2004 強誘電体薄膜の物性制御と次世代メモリデバイスへの応用
- 2000 - 2003 MOCVD法による高品質強誘電体薄膜の作製と物性評価
- 2001 - 2002 Low-Temperature Growth of Ferroelectric and Electrode Thin Films by MOCVD and Their Application to Three-Dimensional High Density Memories
- 2000 - 2001 Analysis and Control of Ferroelectric/Semiconductor (Metal) Interface for Their Device-Application
- 2000 - 2001 Study on the Influence of Grain Boundary of Ferroelectric Thin Films on Elelectrical Properties and Its Application to Memory Devices
- 1997 - 1998 Size Effects of Ferrelectric Thin Films and Influences of the Size on the Thin Film Memory Device Properties
- 1997 - 1998 Fabrication of Ferroelectric Thin Films on Large Size Wafers at High Growth Rate by Metal Organic Chemical Vapor Deposition and Their Application to Memory
- 1996 - 1997 Analysis and Control of Ferroelectric/Semiconductor(Metal)Interface for Their Device-Application
- 1995 - 1996 Investigation and Control of Ferroelectric / Conductor Interface Phenomena and Their Applications to Memory Devices
- 1994 - 1995 Developmental Research on Large Area Growth of Ferroelectric Thin Films with a High Growth Rate by MOCVD and Their Applications to Memory Device
- 1994 - 1995 Preparation of Ferroelectric Superlattice Using Phot-excited Process and Their applications to Functional Deviccs
- 1994 - 1994 有機分子のSTM観測・凝集構造シミュレーションおよびトンネル物性に関する研究
- 1993 - 1994 CVD Growth of Oxide Ferroelectric Thin Films and Control of Their Properties Using Photo Energy
- 1992 - 1993 Preparation of Ferroelectric PZT Thin Films by Photoenhanced CVD and an Application to Memory Devices
- 1992 - 1992 光励起プロセスを用いた強誘電体薄膜の成長とその評価
- 1991 - 1992 High Rate Growth of Large Diameter and High Quality Li_2B_4O_7 Piezoelectric Crystals and Practical Research on SAW Devices
- 1991 - 1991 光励起プロセスを用いた強誘電体薄膜の成長と機能素子への応用
- 1989 - 1991 Preparation of Functional Ceramic Thin Films by Photo-MOCVD and their Applications to Optical Functional Devices
- 1985 - 1986 Preparation of Ferroelectric Thin Film and its Applications to Functional Devices
- 1985 - 1986 Growth of Piezoelectric <Li_2> <B_4> <O_7> Single Crystal and its Applications to Ultra High Frequency Surface Acoustic Wave Devices
- 1986 - 強誘電体薄膜メモリデバイスに関する研究
- 1986 - 強誘電体薄膜の成長とその物性に関する研究
- 強誘電体ナノ構造及び極薄膜の作製と物性
- Study on the Preparation of Ferroelectric Nanostructures and Ultrathin Films and Their Ferroelectric Properties
- Study on the Ferroelectric Thin Film Memory Devices
- Study on the Growth of Ferroelectric Thin Films and Their Properties
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Papers (121)：
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Seiji Nakashima, Tohru Higuchi, Akira Yasui, Toyohiko Kinoshita, Masaru Shimizu, Hironori Fujisawa. Enhancement of photovoltage by electronic structure evolution in multiferroic Mn-doped BiFeO3 thin films. Scientific Reports. 2020. 10. 1
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Seiji Nakashima, Satoshi Kimura, Yuta Kurokawa, Hironori Fujisawa, Masaru Shimizu. Introduction of charged domain walls into BiFeO3 thin films using a pit-patterned SrTiO3 (001) substrate. Japanese Journal of Applied Physics. 2019. 58. SL
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Nao Yoshimura, Hironori Fujisawa, Seiji Nakashima, Masaru Shimizu. Composition control and introduction of an Fe2O3 seed layer in metalorganic chemical vapor deposition of epitaxial BiFeO3 thin films. Japanese Journal of Applied Physics. 2019. 58. 4
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Seiji Nakashima, Ryu Hayashimoto, Hironori Fujisawa, Masaru Shimizu. Bulk photovoltaic effects in Mn-doped BiFeO3 thin films and the optical strains. Japanese Journal of Applied Physics. 2018. 57. 11
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Seiji Nakashima, Shota Seto, Yuta Kurokawa, Hironori Fujisawa, Masaru Shimizu. Domain structure of BiFeO3 thin films grown on patterned SrTiO3(001) substrates. Japanese Journal of Applied Physics. 2017. 56. 10
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MISC (170)：
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中嶋誠二, 藤沢浩訓, 清水勝. High voltage generation by a bulk photovoltaic effect in ferroelectrics for an optical actuator application. 岩谷直治記念財団研究報告書. 2019. 42
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竹内洋平, 兼松宏行, 小高雄哉, 福島宏昌, 藤沢浩訓, 中嶋誠二, 清水勝. ZnOナノワイヤ上でのHf1-xZrxO2薄膜の結晶化. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2018. 65th
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吉村奈緒, 田中拓人, 藤沢浩訓, 中嶋誠二, 清水勝. BiFeO3薄膜のMOCVD成長における成膜圧力の影響. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2018. 65th
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黒川悠太, 中嶋誠二, 藤沢浩訓, 清水勝. (110)配向BiFeO3薄膜への帯電ドメインウォールの導入. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2018. 65th
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林本竜, 中嶋誠二, 藤沢浩訓, 清水勝. MnドープBiFeO3薄膜のバルク光起電力効果とそれによって発生する光誘起歪. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2018. 79th
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Patents (2)：
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圧電体素子
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イリジウム含有薄膜の科学気相成表法による製造方法
Books (6)：
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誘電体材料の特性と測定・評価及び応用技術
技術情報協会 2001
-
強誘電体薄膜メモリ
サイエンスフォーラム社 1995
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Growth and Characterization of Ferroelectric Thin Films by Photo-CVD Process
New Functionally Materials 1993
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セラミックデータブック '92
工業技術製品協会 1992
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強誘電体薄膜集積化技術
サイエンスフォーラム社 1992
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Works (2)：
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MOCVD法による高品質強誘電体薄膜の作製と物性評価
2000 - 2004
-
Prearafirn and characterization of high quality ferroelectric thin films by MOCVD
2000 - 2004
Education (4)：
- - 1982 Kyoto University
- - 1982 Kyoto University Graduate School, Division of Engineering
- - 1978 Shizuoka University Faculty of Engineering
- - 1978 Shizuoka University Faculty of Engineering
Professional career (2)：
- (BLANK) (Kyoto University)
- 工学修士 (静岡大学)
Work history (6)：
- 2004 - - 兵庫県立大学 助教授
- 1998 - - Himeji, Institute of Technology, Associate
- 1982 - 1995 京都大学 助手
- 1982 - 1995 Kyoto University, Research Associate
- 1995 - - 姫路工業大学 助教授
- Professor
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Association Membership(s) (4)：
The Dielectric Society of Japan
, 材料研究会(MRS)
, 電気・電子工学学会(IEEE)
, 応用物理学会
