Rchr
J-GLOBAL ID:200901042518258144   Update date: Jun. 14, 2023

Ohmukai Masato

オオムカイ マサト | Ohmukai Masato
Affiliation and department:
Job title: Associate Professor
Homepage URL  (1): http://www.akashi.ac.jp
Research field  (1): Semiconductors, optical and atomic physics
Research keywords  (2): 物性I ,  asdf
Research theme for competitive and other funds  (3):
  • Optical investigation of mixed crystals
  • Study on Porous Silicon
  • Effects of Laser Irradiation on Semicorductors and Insulators
Papers (141):
  • 中川卓也, 大向 雅人. 有機薄膜堆積装置のマルチボート化. 明石高専研究紀要. 2017. 59. 32-37
  • 中川 卓也, 大向 雅人, 津吉彰. 演習主体とする授業におけるBGM導入による教育効果. 神戸高専研究紀要. 2017. 55. 1-6
  • M. Ohmukai, J. Kyokane. Electrode Efffects on Polyurethane Soft Actuator. World J. Eng. & Technol. 2017. 5. 520-525
  • M. Ohmukai, J. Kyokane. Acetylacetone-Based Electrolyte in Dye Sensitized Solar Cell. World J. Eng. & Technol. 2017. 5. 428-434
  • M. Ohmukai, J. Kyokane. Response to Applied Voltage to Polyurethane Soft Actuators with Loaded Weights. World J. Eng. & Technol. 2017. 5. 383-388
more...
MISC (11):
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Books (5):
  • The effect of chemical treatment on porous silicon: the role of alcohol
    Mater. Res. Soc. Symp. Proc. 2003
  • Photoacoustic spectra from copper phthalocyanine films on Si wafers
    Mater. Res. Soc. Symp. Proc. 2001
  • The effect of surface roughness on photoluminescence of porous silicon
    Mater. Res. Soc. Symp. Proc. 2001
  • Application of photoacoustic spectroscopy to porous silicon
    Mater. Res. Soc. Symp. Proc. 1999
  • The effect of post-anodization chemical etching on porous silicon investigated by means of photoluminescence and IR spectroscopy
    Mater. Res. Soc. Symp. Proc. 1999
Lectures and oral presentations  (89):
  • バーコート法によるZnO薄膜の作製(界面活性剤の添加効果)
    (電子情報通信学会関西支部第21回学生会研究発表講演会(兵庫県立大学姫路工学キャンパス)C1-3 2016)
  • フォトリソグラフィによる透明電極加工条件の検討
    (第17回IEEE広島支部学生シンポジウム(岡山大学津島キャンパス)11/21,22 2015)
  • ラマン分光法によるZnO薄膜の測定および評価
    (平成26年度電気関係学会四国支部連合大会、11-10 2014)
  • MOD法によるガラス基板上へのZnO薄膜の作製
    (神戸高専産学官金技術フォーラム'14、P-2-02 2014)
  • ZnO薄膜(MOD法)の焼成温度と積層における変化
    (神戸高専産学官技術フォーラム'13、P-2-02、p.83 2013)
more...
Education (4):
  • - 1993 Osaka Prefecture University
  • - 1993 Osaka Prefecture University Graduate School, Division of Engineering
  • - 1986 Osaka Prefecture University School of Engineering
  • - 1986 Osaka Prefecture University Faculty of Engineering
Professional career (2):
  • Ph.D. in engineering (Osaka Prefecture University)
  • Master of Engineering (Osaka Prefecture University)
Work history (9):
  • 2010/04 - 現在 National Institute of Technology, Akashi College Department of Electrical and Computer Engineering
  • 2007/04 - 2010/03 National Institute of Technology, Akashi College Department of Electrical and Computer Engineering
  • 2002/04 - 2007/03 National Institute of Technology, Akashi College
  • 1996/04 - 2002/03 National Institute of Technology, Akashi College
  • 1994/04 - 1996/03 National Institute of Technology, Akashi College
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