Rchr
J-GLOBAL ID：200901048364078677   Update date: Jan. 11, 2024

Doi Takashi

ドイ タカシ | Doi Takashi
Affiliation and department：
JSR Corporation

About JSR Corporation


Research field  (3)： Polymer materials ,  Polymer chemistry ,  Synthetic organic chemistry
Research keywords  (3)： フォトレジスト ,  耐熱性樹脂 ,  有機合成
Papers (21)：
  • Takashi Doi, Shotaro Sudo, Tsutomu Shimokawa. Investigation on polymer design to enhance dissolution inhibition effects of photochemical acid generators for hexafluoroisopropylalcohol-containing polystyrene in non-chemically amplified resists. Journal of Polymer Science. 2023. 61. 13. 1308-1317
  • Takashi Doi, Isao Nishimura, Masahiro Kaneko, Tsutomu Shimokawa. Development of Low-Residual-Stress Photosensitive Adhesive Materials for Wafer-Scale Microfluidic Device Fabrication. Journal of Photopolymer Science and Technology. 2022. 35. 4. 313-319
  • Takashi Doi, Tsutomu Shimokawa. Organic-Inorganic Hybrid Thermoset-Based Dual Tone-Type Photosensitive Material. ACS Applied Polymer Materials. 2022. 4. 12. 8731-8739
  • Takashi Doi, Tsutomu Shimokawa. Development of A Phenolic Resin-Based Material with Low Coefficient of Thermal Expansion Patternable by Laser Ablation. Journal of Photopolymer Science and Technology. 2022. 34. 6. 565-570
  • Takashi Doi, Igor Rozhanskii, Takahiro Nakamura, Tsutomu Shimokawa. Nonreversible surface relief formation in thin films of cinnamate derivatives containing benzoxazine structure. Journal of Applied Polymer Science. 2022. 52173-52173
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MISC (13)：
  • Takashi Doi, Igor Rozhanskii, Takahiro Nakamura, Tsutomu Shimokawa. Cover Image, Volume 139, Issue 21. Journal of Applied Polymer Science. 2022. 139. 21
  • Takashi Doi, Yuji Yada, Kota Nishino, Makoto Sugiura, Tsutomu Shimokawa. Cover Image, Volume 58, Issue 8. Journal of Polymer Science. 2020. 58. 8
  • 窪 寛仁, 土井 貴史, 西村 功, 林 英治, 稗田 克彦, ピータース サラ, ヴァン・ロースブルック ルーベン. ウエハースケールマイクロ流路用感光性接着剤 (特集 電子技術・材料の最新動向). JETI = ジェティ : Japan energy & technology intelligence : エネルギー・化学・プラントの総合技術誌. 2018. 66. 1. 90-94
  • Development of New Photosensitive Low CTE Materials. 2017. 124. 6-10
  • 窪寛仁, 土井貴史, 西村功, 林英治, 稗田克彦, PEETERS Sara, VAN ROOSBROECK Ruben. Photo-Patternable Adhesive for Wafer-Scale Microfluidic devices. JSRテクニカルレビュー. 2017. 124. 1-5
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Patents (13)：
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Lectures and oral presentations  (22)：
  • Development of low-residual-stress photosensitive adhesive materials for wafer-scale microfluidic device fabrication
    (The 39nd International Conference of Photopolymer Science and Technology 2022)
  • Development of Photo-Patternable and Room Temperature Adhesive Materials
    (2016)
  • Improvement of Post Exposure Delay of Photo-Patternable and Adhesive Materials for Wafer-Scale Microfluid
    (The 32th International Conference of Photopolymer Science and Technology 2015)
  • Development of New Photosensitive Low CTE Materials
    (The 32nd International Conference of Photopolymer Science and Technology 2015)
  • 低誘電耐熱樹脂の開発
    (第22回日本ポリイミド・芳香族高分子会議 2014)
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Professional career (1)：
  • 博士(理学) (大阪府立大学大学院)
Association Membership(s) (1)：
高分子学会
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