Rchr
J-GLOBAL ID:200901051359423340   Update date: Apr. 28, 2020

Okada Takayuki

オカダ タカユキ | Okada Takayuki
Affiliation and department:
Job title: Ph. D. student
Research field  (3): Material fabrication and microstructure control ,  Electronic devices and equipment ,  Electric/electronic material engineering
Research keywords  (8): MOSFET ,  絶縁膜 ,  極薄膜 ,  ヘテロエピタキシャル ,  MOSFET ,  insulation film ,  ultra thin film ,  Heteroepitaxial
Research theme for competitive and other funds  (4):
  • 2004 - 2006 Si基板上への単結晶アルミナ極薄膜の作製とデバイス応用
  • 2004 - 2006 Fabrication of single crystalline Al2O3 ultra-thin film and its device application
  • Si基板上に成膜した単結晶Al2O3極薄膜の評価
  • Evaluation of single crystalline Al2O3 ultra thin fim fabricated on Si substrates
MISC (12):
Education (2):
  • - 2004 Toyohashi University of Technology
  • - 2004 Toyohashi University of Technology Graduate School, Division of Engineering Electrical and Electronic Engineering
Professional career (1):
  • Master of Engineering (Toyohashi University of Technology)
Association Membership(s) (2):
日本応用物理学会 ,  The Japan Society of Applied Physics
※ Researcher’s information displayed in J-GLOBAL is based on the information registered in researchmap. For details, see here.

Return to Previous Page