Rchr

J-GLOBAL ID：200901052869723132 Update date: Apr. 28, 2020

Ha Taeho

ハテホ | Ha Taeho

Affiliation and department：
Job title：文部科学省教官

Research field (2)： Manufacturing and production engineering , Optical engineering and photonics

Research keywords (5)： silicon wafer Defect Measurement , Optical Measurement , FIB加工 , シリコンウエハ加工欠陥計測 , 超精密光応用計測

Research theme for competitive and other funds (2)：

光散乱によるCMP加工表面薄膜欠陥計測に関する研究
Optical Measurement of CMP Film Surface Defects using Light Scattering

MISC (10)：

Laser Scattering Measurement of Microdefects on Silicon Oxide Wafer Surface. Key Engineering Materials. 2004
Laser Scattering Measurement of Microdefects on Silicon Oxide Wafer Surface. Key Engineering Materials. 2004
TH Ha, T Miyoshi, Y Takaya, S Takahashi. Size determination of microscratches on silicon oxide wafer surface using scattered light. PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY. 2003. 27. 3. 265-272
TH Ha, T Miyoshi, Y Takaya, S Takahashi. Size determination of microscratches on silicon oxide wafer surface using scattered light. PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY. 2003. 27. 3. 265-272
Evaluation of microdefects on SiO₂Filmed wafer surface from the Scattered light. Proceeding of Euspen Ceuropean Society for precision engineering and nanotechnology. 2002

ｍore...

Education (6)：

- 2003 Osaka University
- 2003 Osaka University Graduate School, Division of Engineering mechanical engineering and systems
- 2000 Osaka University
- 2000 Osaka University Graduate School, Division of Engineering
- 1995 国立釜山大学工学部精密機械工学

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Professional career (2)：

Master (Osaka University)
Ph. D (Osaka University)

Association Membership(s) (2)：

精密工学会 , JSPE

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