Kakiuchi Takuhiro

カキウチタクヒロ | Kakiuchi Takuhiro

Affiliation and department：
Job title： Associate Professor

Research field (4)： Quantum beam science , Basic physical chemistry , Semiconductors, optical and atomic physics , Electronic devices and equipment

Research keywords (9)： Surface and Interface , Surface Physical Properties , Quantum chemistry , Physical properties of semiconductor surfaces , Structure Chemistry , Auger-electron spectroscopy , X-ray photoelectron spectroscopy , Coincidence spectroscopy , Surface Science

Research theme for competitive and other funds (14)：

2021 - 2024 金属(Hf・Zr)/Si半導体表面界面局所構造中シリサイドの酸化反応理解と制御
2017 - 2020 凹凸あるSi表面でのhigh-k材料超薄膜の成長過程とその低次元物性発現の観測
2018 - 2018 Si(110)単結晶上に作製した二酸化ハフニウム超薄膜の表面界面を選別した局所価電子状態の同時観測
2017 - 2018 固体表面研究用角度分解同時計数装置の開発による単原子分光研究
2016 - 2017 リアルタイムX線光電子分光法によるシリコン(Si)単結晶上に作製したハフニウム(Hf)超薄膜の酸化過程の観測

Show all

Papers (30)：

Takuhiro Kakiuchi, Tomoki Matoba, Daisuke Koyama, Yuki Yamamoto, Akitaka Yoshigoe. Oxidation Mechanisms of Hafnium Overlayers Deposited on a Si(111) Substrate. Langmuir. 2022. 38. 8. 2642-2650
T. Kakiuchi, T. Matoba, D. Koyama, Y. Yamamoto, D. Katoh, A. Yoshigoe. Precise chemical state analyses of ultrathin hafnium films deposited on clean Si(111)-7 x 7 surface using high-resolution core-level photoelectron spectroscopy. Surface Science. 2020. 701. 121691-1-121691-8
KAKIUCHI Takuhiro, YAMASAKI Hideki, TSUKADA Chie, YOSHIGOE Akitaka. Initial oxidation processes of ultrathin hafnium film and hafnium disilicide islands on Si(100)-2 x 1 surfaces studied using core-level X-ray photoelectron spectroscopy. Surface Science. 2020. 693. 121551-1-121551-8
Takuhiro Kakiuchi, Kyouhei Ikeda, Kazuhiko Mase, Shin-ichi Nagaoka. Local valence electronic states of silicon (sub)oxides on HfO2/Si-(sub)oxide/Si(110) and HfSi2/Si-(sub)oxide/Si(110) Islands. Surface Science. 2019. 681. 9-17
Takuhiro Kakiuchi, Yuya Yoshizaki, Hiroyuki Kubota, Yuki Sato, Shin-ichi Nagaoka, Kazuhiko Mase. Direct Observations of Correlation between Si-2p Components and Surface States on Si(110)-16 x 2 Single-Domain Surface Using Si-L23VV Auger-Electron and Si-2p Photoelectron Coincidence Measurements. JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN. 2017. 86. 5

ｍore...

MISC (17)：

垣内拓大, 白石朗, 山根亮太郎, 矢野貴大, 津田泰孝, 吉越章隆. Potential barrier for oxidation of HfSi₂/Si(111) surface studied with super sonic O₂ molecular beam. 日本表面真空学会学術講演会要旨集(Web). 2021. 2021
垣内拓大, 山崎英輝, 塚田千恵, 塚田千恵, 吉越章隆. Si(100)-2×1清浄表面に作製したハフニウム超薄膜の酸素吸着と脱離. 分子科学討論会講演プログラム&要旨(Web). 2018. 12th. ROMBUNNO.2P049 (WEB ONLY)
T. Kakiuchi, M. Yamasaki, K. Mase. Surface- and Interface-Selective Local Valence Electronic States of Ultrathin Hafnium Silicide Films Deposited on Clean Si(110) Surface. PF Act. Rep. 2016. 2017. 34
垣内拓大, 中納佑二, 長岡伸一, 間瀬一彦. Si(110)-16×2シングルドメイン清浄表面への水素吸着過程とその表面物性. 物構研サイエンスフェスタ要旨集. 2015. 3rd
Kakiuchi Takuhiro, Katsuragi Takuma, Nakano Yuji, Yoshigoe Akitaka, Nagaoka Shin-ichi, Mase Kazuhiko. Hafnium adsorption on clean Si(110)-16x2 single domain surface studied by low energy electron diffraction and electron spectroscopy. Abstract of annual meeting of the Surface Science of Japan. 2015. 35. 0. 138-138

ｍore...

Lectures and oral presentations (68)：

Local/entire oxidation mechanism of hafnium absorbed Si(111)
(2023)
Oxidation of non-equilibrium hafnium-adsorbed silicon (111) surface/interface induced by supersonic oxygen molecule beam irradiation
(2022)
Potential barrier for oxidation of HfSi2/Si(111) surface studied with super sonic O2 molecular beam
(Annual Meeting of The Japan Society of Vacuum and Surface Science 2021)
Oxidation dynamics at interface and surface of an ultrathin hafnium film on Si(111) substrate observed by core level spectroscopy
(2021)
PFハイブリッドモード用パルスセレクターを用いた内殻励起イオン脱離計測
(第34回日本放射光学会年会放射光科学合同シンポジウム 2021)

ｍore...

Education (5)：

2006 - 2008 Graduate University for Advanced Studies School of High Energy Accelerator Science Department of Materials Structure Science
- 2008 The Graduate University for Advanced Studies
2004 - 2006 Ehime University Graduate School of Science and Engineering
2000 - 2004 Ehime University Department of Chemistry
- 2004 Ehime University Faculty of Science

Work history (3)：

2023/04 - 現在 Ehime University Graduate school of science and engineering Associate Professor
2008/04 - 2023/03 Ehime University Graduate School of Science and Engineering Assistant Professor
2017/08 - 2018/08 Helmholtz Zentrum Berlin Methods and Instrumentation for Synchrotron Radiation Research Guest Researcher

Committee career (2)：

2015/04 - 現在愛媛大学理学同窓会幹事
2020/08 - 2020/08 愛媛大学Webオープンキャンパス理学部WG座長オープンキャンパス理学部WG

Awards (2)：

2020/12 - 愛媛大学理学部理学部研究奨励賞
2019/12 - Faculty of Science, Ehime University Research Encouragement Prize

Association Membership(s) (4)：

JAPAN SOCIETY FOR MOLECULAR SCIENCE , THE SURFACE SCIENCE SOCIETY OF JAPAN , THE PHYSICAL SOCIETY OF JAPAN , THE CHEMICAL SOCIETY OF JAPAN

※ Researcher’s information displayed in J-GLOBAL is based on the information registered in researchmap. For details, see here.

Return to Previous Page