Rchr

J-GLOBAL ID：200901083400985139 Update date: Apr. 05, 2020

Toshiyuki Matsumoto

マツモトトシユキ | Toshiyuki Matsumoto

Affiliation and department：
Job title： Others

Research field (1)： Electric/electronic material engineering

Research keywords (2)：新材料関連研究 , Studies of New Materials

Research theme for competitive and other funds (2)：

1963 - 高周波メタンプラズマCVD法によるDLC薄膜の作製
1963 - Deposition of DLC films Using RF Plasma CVD method

MISC (11)：

パルスプラズマプロセスの特性とYBaCuO薄膜析出. 電気学会(論文誌A). 1991. 111. 8
Characteristic of a Pulsed Plasma Process and YBACuO Thin Film Deposition. The Transaction of The Institute of Electrical Engineers of Japan. 1991. 111. 8
K EBIHARA, T IKEGAMI, T MATSUMOTO, H NISHIMOTO, S MAEDA, K HARADA. DIAMONDLIKE CARBON-FILM DEPOSITION USING A REACTIVE PULSED ELECTROMAGNETIC INDUCTIVE PLASMA PROCESS. JOURNAL OF APPLIED PHYSICS. 1989. 66. 10. 4996-5000
高気圧SF₆混合気体中の沿面フラッシオーバ特性(第1報). 九州東海大学紀要工学部. 1985. 12
The Characteristics of Impulse Surface Flashover Voltage in ompressed SF₆-air Gas Mixture ((]G0001[)). BULLETIN OF FACULTY OF ENGINEERING KYUSYU TOKAI UNIVERSITY. 1985. 12

ｍore...

Education (4)：

- 1991 Kumamoto University
- 1991 Kumamoto University Graduate School, Division of Engineering Industrial science
- 1966 Tokai University School of Engineering
- 1966 TOKAI UNIVERSITY Faculty of Engineering

Professional career (1)：

Master(Engineering) (Tokai University)

Association Membership(s) (3)：

応用物理学会 , 静電気学会 , 電気学会

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