Rchr
J-GLOBAL ID：200901084940804350
Update date: May. 01, 2020
Nagai Hisao
ナガイ ヒサオ | Nagai Hisao
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Affiliation and department：
Nagoya University
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Detailed information
Research field (1)：
Thin-film surfaces and interfaces
Research keywords (2)：
プラズマプロセス
, Plasma Process
Research theme for competitive and other funds (2)：
高密度プラズマを用いた低誘電率層間絶縁膜エッチングに関する研究
Studies on Etching Mechanism of Interlayer Low-k Films Employing High-Density Plasma
MISC (2)：
H Nagai, S Takashima, M Hiramatsu, M Hori, T Goto. Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N-2/H-2 and N-2/NH3 plasmas. JOURNAL OF APPLIED PHYSICS. 2002. 91. 5. 2615-2621
H Nagai, S Takashima, M Hiramatsu, M Hori, T Goto. Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N-2/H-2 and N-2/NH3 plasmas. JOURNAL OF APPLIED PHYSICS. 2002. 91. 5. 2615-2621
Education (2)：
- 1999 Meijo University
- 1999 Meijo University Graduate School, Division of Engineering
Professional career (1)：
Master of Engineering (Meijo University)
Committee career (1)：
電気学会 学生員
Awards (1)：
2001 - DPS 2000 Award for Young Researcher
Association Membership(s) (2)：
電気学会
, 応用物理学会
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