Rchr
J-GLOBAL ID:200901085087060644   Update date: Aug. 29, 2020

Hata Nobuhiro

ハタ ノブヒロ | Hata Nobuhiro
Affiliation and department:
Homepage URL  (1): http://www.aist.go.jp/RESEARCHERDB/cgi-bin/worker_detail.cgi?call=namae&rw_id=N53140655
Research field  (5): Chemical reaction and process system engineering ,  Electronic devices and equipment ,  Electric/electronic material engineering ,  Optical engineering and photonics ,  Thin-film surfaces and interfaces
Research keywords  (1): シリコン 配線技術 低誘電率材料 層間絶縁膜
Research theme for competitive and other funds  (1):
  • Low-k 材料・配線技術
MISC (28):
Education (2):
  • The University of Tokyo
  • 東京大学大学院
Professional career (1):
  • 工学博士
Association Membership(s) (4):
Materials Research Society ,  (社)応用物理学会 ,  Materials Research Society ,  Japan Society of Applied Physics
※ Researcher’s information displayed in J-GLOBAL is based on the information registered in researchmap. For details, see here.

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