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J-GLOBAL ID：200902000010610410
Reference number：91A0563265
Evaluation of SiNx film deposited by CVD method.
CVD法SiNx膜の評価
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Author (4)：
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,
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Material：
Volume：
38th
Issue：
Pt 2
Page：
573
Publication year：
Mar. 1991
JST Material Number：
Y0054A
Document type：
Proceedings
Country of issue：
Japan (JPN)
Language：
JAPANESE (JA)
Terms in the title (2)：
Terms in the title
Keywords automatically extracted from the title.
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