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ArticleJ-GLOBAL ID:200902000010610410整理番号:91A0563265

CVD法SiNx膜の評価

Evaluation of SiNx film deposited by CVD method.

著者:野口仁(信越化学工業)、永田愛彦(信越化学工業)、樫田周(信越化学工業)・・・
資料名:応用物理学関係連合講演会講演予稿集 巻:38th 号:Pt 2 ページ:573
発行年:1991年03月
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