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J-GLOBAL ID：200902000017810938   Reference number：81A0117669

Proximity correction in electron beam lithography.

電子線リソグラフィにおける隣接効果補正
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BRETSCHER E

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Material：
IBM Technical Disclosure Bulletin  (IBM Tech Disclosure Bull)

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Volume： 23  Issue： 6  Page： 2541  Publication year： Nov. 1980 
JST Material Number： E0292B  ISSN： 0018-8689  CODEN： IBMTA  Document type： Article
Article type： 解説  Country of issue： United States (USA)  Language： ENGLISH (EN)
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lithography

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Manufacturing technology of solid-state devices 
(NC03030V)

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電子線リソグラフィ

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