Art
J-GLOBAL ID：200902000046974699   Reference number：86A0293219

Un progres important de la technologie des dispositifs semiconducteurs: L’e ́pitaxie a jet mole ́culaire.

半導体薄膜作製法の重要な進歩 分子ジェットによるエピタクシー
Material：
Vide, les Couches Minces  (Vide)

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Volume： 40  Issue： 229  Page： 627-629  Publication year： Nov. 1985 
JST Material Number： E0358A  ISSN： 0223-4335  CODEN： VCMIDS  Document type： Article
Article type： 解説  Country of issue： France (FRA)  Language： FRENCH (FR)
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epitaxy

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,...
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Thesaurus term/Semi thesaurus term
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MBE

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JST classification (1)：
JST classification
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Semiconductor thin films 
(BK14040E)

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Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
半導体薄膜

About 半導体薄膜

, 
作製法

About 作製法

, 
分子

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, 
ジェット

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, 
エピタクシー

About エピタクシー


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