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ArticleJ-GLOBAL ID:200902000061172850整理番号:84A0010408

Elimination du bore dans le silicium par fusion de zone sous plasma inductif haute fre ́quence: Role des plasmas re ́actifs et du laitier. Caracte ́risation du silicium photovoltai ̈que.

高周波誘導プラズマ下でのゾーン融解によるシリコン中のほう素の除去 反応性プラズマとスラグの役割 光起電力用シリコンの特性評価

著者:MORVAN D(Ecole Nationale Sup<span style=text-decoration:overline>e ́</span>rieure de Chimie de Paris)、AMOUROUX J(Ecole Nationale Sup<span style=text-decoration:overline>e ́</span>rieure de Chimie de Paris)、CHARPIN M C(Ecole Nationale Sup<span style=text-decoration:overline>e ́</span>rieure de Chimie de Paris)・・・
資料名:Rev Phys Appl 巻:18 号:4 ページ:239-251
発行年:1983年04月
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