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ArticleJ-GLOBAL ID:200902000070332177整理番号:91A0649930

常圧焼結窒化ケイ素の高温環境下におけるき裂進展挙動

Crack growth behavior of a normal-pressure-sintered silicon nitride compact in high-temperature environment.

著者:上野明(豊田工大)、岸本秀弘(豊田工大)、河本洋(トヨタ自動車)・・・
資料名:日本材料学会学術講演会前刷 巻:40th ページ:249-251
発行年:1991年
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J-GLOBAL: Linking, Expanding and Sparking

About J-GLOBAL

Linking

J-GLOBAL links information that represents the key to research and development. For example, linking articles and patents with people (authors and inventors) enables the extraction of a sequence of information.
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Expanding

The system enables searches of similar kinds of content through linkage with external sites.
It helps you to obtain knowledge from dissimilar fields and discover concepts that cross the boundaries of specialisms.

Sparking

Through repeated linkage and expansioniteration, J-GLOBAL provides unexpected hints for problem-solving and the illumination of new ideas.