Art
J-GLOBAL ID：200902000086130906
Reference number：88A0397699
Surface structure change during solid phase epitaxial growth of an amorphous Si film deposited on Si(111).
Si(111)上に形成した非晶質Si膜の固相エピタキシャル成長時における表面構造の変化
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Author (1)：
Material：
Volume：
52
Issue：
8
Page：
619-621
Publication year：
Feb. 22, 1988
JST Material Number：
H0613A
ISSN：
0003-6951
CODEN：
APPLAB
Document type：
Article
Article type：
短報
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Semiconductor thin films
, Surface structure of semiconductors
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