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ArticleJ-GLOBAL ID:200902000086130906整理番号:88A0397699

Surface structure change during solid phase epitaxial growth of an amorphous Si film deposited on Si(111).

Si(111)上に形成した非晶質Si膜の固相エピタキシャル成長時における表面構造の変化

著者:SHIGETA Y(Yokohama City Univ., Yokohama, JPN)
資料名:Appl Phys Lett 巻:52 号:8 ページ:619-621
発行年:1988年02月22日
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