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J-GLOBAL ID:200902000102050640   Reference number:90A0509196

Taper etching technology using oxygen ion and plasma.

酸素イオンプラズマを用いたテーパエッチング技術
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Volume:Issue:Page: 56-59  Publication year: Jun. 1990 
JST Material Number: Y0509A  ISSN: 0286-5025  Document type: Article
Article type: 解説  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Manufacturing technology of solid-state devices 
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