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ArticleJ-GLOBAL ID:200902000167089650整理番号:90A0019722

The effects of secondary electrons from a silion substrate on SR X-ray lithography.

SR X線リソグラフィーでのシリコン基板からの二次電子放出の効果

著者:OGAWA T(Hitachi Ltd., Tokyo)、MOCHIJI K(Hitachi Ltd., Tokyo)、SODA Y(Hitachi Ltd., Tokyo)・・・
資料名:Jpn J Appl Phys Part 1 巻:28 号:10 ページ:2070-2073
発行年:1989年10月
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