Art
J-GLOBAL ID：200902000167089650
Reference number：90A0019722
The effects of secondary electrons from a silion substrate on SR X-ray lithography.
SR X線リソグラフィーでのシリコン基板からの二次電子放出の効果
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Author (4)：
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Material：
Volume：
28
Issue：
10
Page：
2070-2073
Publication year：
Oct. 1989
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
Thesaurus term：
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices
Terms in the title (4)：
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