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ArticleJ-GLOBAL ID:200902000167263625整理番号:92A0219874

Active to passive transition in the oxidation of silicon carbide at high temperature and low pressure in molecular and atomic oxygen.

高温で低圧の分子状酸素と原子状酸素存在下での炭化けい素の酸化における活性状態より不働態への転移

著者:BALAT M(IMP‐CNRS, Font‐Romeu, FRA)、FLAMANT G(IMP‐CNRS, Font‐Romeu, FRA)、MALE G(IMP‐CNRS, Font‐Romeu, FRA)・・・
資料名:J Mater Sci 巻:27 号:3 ページ:697-703
発行年:1992年02月01日
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About J-GLOBAL

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J-GLOBAL links information that represents the key to research and development. For example, linking articles and patents with people (authors and inventors) enables the extraction of a sequence of information.
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The system enables searches of similar kinds of content through linkage with external sites.
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