Art
J-GLOBAL ID：200902000181977592   Reference number：85A0405030

SEM-EDAX analysis of interaction of photoresist with thick films.

フォトレジストと厚膜との相互作用のSEM-EDAX解析
Author (3)：
SINGH A

About SINGH A

(Univ. Modena, Italy)

About Univ. Modena, Italy

, 
PRUDENZIATI M

About PRUDENZIATI M

(Univ. Modena, Italy)

About Univ. Modena, Italy

, 
MORTEN B

About MORTEN B

(Univ. Modena, Italy)

About Univ. Modena, Italy


Material：
Microelectronics Reliability  (Microelectronics and Reliability)

About Microelectronics Reliability


Volume： 25  Issue： 2  Page： 243-245,248-251,254-255  Publication year： 1985 
JST Material Number： C0530A  ISSN： 0026-2714  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)
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photoresist

About photoresist

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
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migration

About migration


   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=85A0405030&from=J-GLOBAL&jstjournalNo=C0530A") }}
JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
フォトレジスト

About フォトレジスト

, 
厚膜

About 厚膜

, 
相互作用

About 相互作用

, 
SEM

About SEM

, 
解析

About 解析


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