Alkali-developable silicone-based negative photoresist(SNP) for deep UV, electron beam, and X-ray lithographies.

BAN H; TANAKA A; KAWAI Y; DEGUCHI K

Art

J-GLOBAL ID：200902001846829103 Reference number：90A0074602

Alkali-developable silicone-based negative photoresist(SNP) for deep UV, electron beam, and X-ray lithographies.

深いUV,電子ビーム,X線リソグラフィーのためのアルカリ現像可能なシリコンをベースにしたネガティブ光レジスト

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Material：
Volume： 28 Issue： 10 Page： L1863-L1865 Publication year： Oct. 1989
JST Material Number： F0599B ISSN： 0021-4922 Document type： Article
Article type：短報 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Other reactions of polymer , Techniques for samples

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