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ArticleJ-GLOBAL ID:200902001877702497整理番号:92A0081276

TMPD‐ハロゲン化合物系におけるイオン対生成 気相電子付着との相関

Ion-pair formation in TMPD-halogenated compound systems. Correlation with electron attachment in the gas phase.

著者:花室圭一(福井工大)、中谷佳次(福井工大)、嶋森洋(福井工大)
資料名:放射線化学討論会講演要旨集 巻:33rd ページ:69-70
発行年:1990年
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