Art
J-GLOBAL ID：200902001881131909   Reference number：87A0361229

Fundamental technology for LSI process. 9. Thin film formation 2.

LSIプロセスの基礎技術 IX 薄膜形成 II
Author (1)：
MORITA YOSHIKIMI

About MORITA YOSHIKIMI

(松下電子工業 京都研)

About 松下電子工業 京都研


Material：
月刊Semiconductor World  (月刊セミコンダクターワールド)

About 月刊Semiconductor World


Volume： 6  Issue： 1  Page： 147-150  Publication year： Jan. 1987 
JST Material Number： Y0509A  ISSN： 0286-5025  Document type： Article
Article type： 解説  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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LSI

About LSI

,...
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Thesaurus term/Semi thesaurus term
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pressure dependence

About pressure dependence


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JST classification (1)：
JST classification
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Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (4)：
Terms in the title
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LSI

About LSI

, 
プロセス

About プロセス

, 
基礎

About 基礎

, 
薄膜形成

About 薄膜形成


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