Art
J-GLOBAL ID:200902001908893091   Reference number:91A0072857

Fabrication of BESOI-materials using implanted nitrogen as an effective etch stop barrier.

注入窒素を使用した効果的なエッチストップ障壁としてのBESOI材料の製造
Author (1):
Material:
Page: 64-65  Publication year: 1989 
JST Material Number: K19901039  Document type: Proceedings
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=91A0072857&from=J-GLOBAL&jstjournalNo=K19901039") }}
JST classification (1):
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
Terms in the title (5):
Terms in the title
Keywords automatically extracted from the title.

Return to Previous Page