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ArticleJ-GLOBAL ID:200902001910382835整理番号:86A0358148

Enhancement of sliding life of MoS2 films deposited by combining sputtering and high-energy ion implantation.

スパッタリング法と高エネルギーイオン注入法を組合せて作ったMoS2膜のすべり寿命の改善

著者:CHEVALLIER J(Univ. Aarhus, Denmark)、OLESEN S(Univ. Aarhus, Denmark)、S<span style=text-decoration:overline>O/</span>RENSEN G(Univ. Aarhus, Denmark)・・・
資料名:Appl Phys Lett 巻:48 号:13 ページ:876-877
発行年:1986年03月31日
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