Art
J-GLOBAL ID：200902001912311463   Reference number：90A0237001

Electron-beam proximity printing of half-micron devices.

1/2ミクロン素子の電子ビーム近接印刷
Author (4)：
MEISSNER K

About MEISSNER K

(IBM, Sindelfingen, DEU)

About IBM, Sindelfingen, DEU

, 
HAUG W

About HAUG W

(IBM, Sindelfingen, DEU)

About IBM, Sindelfingen, DEU

, 
SILVERMAN S

About SILVERMAN S

(IBM, Vermont)

About IBM, Vermont

, 
SONCHIK S

About SONCHIK S

(IBM, Vermont)

About IBM, Vermont


Material：
Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures  (Journal of Vacuum Science & Technology. B. Microelectronics Processing and Phenomena)

About Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures


Volume： 7  Issue： 6  Page： 1443-1447  Publication year： Nov. 1989 
JST Material Number： E0974A  ISSN： 1071-1023  CODEN： JVTBD9  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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lithography

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,...
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重合せ精度

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JST classification (1)：
JST classification
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Manufacturing technology of solid-state devices 
(NC03030V)

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電子ビーム

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