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ArticleJ-GLOBAL ID:200902001912685533整理番号:89A0115879

Defektdichte und Oberflaechenkontamination im μm Bereich in der Halbleiterspeicherproduktion.

半導体メモリの製造における格子欠陥密度と表面汚染

著者:ROHRER U(IBM Deutschland GmbH, Sindelfingen, DEU)、STEINBECK H H(IBM Deutschland GmbH, Sindelfingen, DEU)
資料名:VDI Ber (Ver Dtsch Ing) 号:693 ページ:225-228
発行年:1988年
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J-GLOBAL: Linking, Expanding and Sparking

About J-GLOBAL

Linking

J-GLOBAL links information that represents the key to research and development. For example, linking articles and patents with people (authors and inventors) enables the extraction of a sequence of information.
It’s useful for making new discoveries and uncovering new information.

Expanding

The system enables searches of similar kinds of content through linkage with external sites.
It helps you to obtain knowledge from dissimilar fields and discover concepts that cross the boundaries of specialisms.

Sparking

Through repeated linkage and expansioniteration, J-GLOBAL provides unexpected hints for problem-solving and the illumination of new ideas.