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ArticleJ-GLOBAL ID:200902001966360672整理番号:85A0400828

極薄ゲート酸化膜の信頼性

Reliability of very thin gate oxide.

著者:嶋屋正一(NTT厚木電通研)、塩野登(NTT厚木電通研)、逸見学(NTT厚木電通研)・・・
資料名:電子通信学会技術研究報告 巻:85 号:74 ページ:49-56(SSD85-19)
発行年:1985年06月27日
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