J-GLOBAL ID：200902001968582575整理番号：89A0490816
ナノメータ絶縁膜によるLSI用新デバイスの可能性
Possibility of novel device for LSI using nanometer insulator film.
著者：浅田雅洋(東京工大 工)、坂口知明(東京工大 工)、渡辺正裕(東京工大 工)
資料名：電子情報通信学会全国大会講演論文集 巻：1989 号：Autumn Pt.5 ページ：5.189-5.190
発行年：1989年09月
資料名：電子情報通信学会全国大会講演論文集 巻：1989 号：Autumn Pt.5 ページ：5.189-5.190
発行年：1989年09月
J-GLOBAL ID: 200902001968582575
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