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J-GLOBAL ID:200902001968582575   Reference number:89A0490816

Possibility of novel device for LSI using nanometer insulator film.

ナノメータ絶縁膜によるLSI用新デバイスの可能性
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Volume: 1989  Issue: Autumn Pt.5  Page: 5.189-5.190  Publication year: Sep. 1989 
JST Material Number: G0508A  Document type: Proceedings
Article type: 短報  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Solic-state devices in general 
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