J-GLOBAL ID:200902001968582575整理番号:89A0490816
ナノメータ絶縁膜によるLSI用新デバイスの可能性
Possibility of novel device for LSI using nanometer insulator film.
著者:浅田雅洋(東京工大 工)、坂口知明(東京工大 工)、渡辺正裕(東京工大 工)
資料名:電子情報通信学会全国大会講演論文集 巻:1989 号:Autumn Pt.5 ページ:5.189-5.190
発行年:1989年09月
資料名:電子情報通信学会全国大会講演論文集 巻:1989 号:Autumn Pt.5 ページ:5.189-5.190
発行年:1989年09月
J-GLOBAL ID: 200902001968582575
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