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ArticleJ-GLOBAL ID:200902001969603681整理番号:91A0145549

GaAs/AlGaAs photonic integrated circuits fabricated using chemically assisted ion beam etching.

化学的イオンビームエッチングで作製したGaAs/AlGaAs光集積回路

著者:GRANDE W J(Cornell Univ., New York)、JOHNSON J E(Cornell Univ., New York)、TANG C L(Cornell Univ., New York)
資料名:Applied Physics Letters 巻:57 号:24 ページ:2537-2539
発行年:1990年12月10日
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