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ArticleJ-GLOBAL ID:200902001969623518整理番号:88A0557926

Preferential sputtering in dilute Cu-Ni alloys.

稀薄Cu‐Ni合金における選択スパッタリング

著者:KAMIYA I(Univ. Tokyo, Tokyo, JPN)、BUCK T M(AT&T Bell Lab., NJ, USA)、SAKURAI T(Univ. Tokyo, Tokyo, JPN)・・・
資料名:Nucl Instrum Method Phys Res Sect B Beam Interact Mater At 巻:33 号:1/4 ページ:479-481
発行年:1988年06月
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