Art
J-GLOBAL ID：200902001977310146   Reference number：81A0117752

Elimination of chlorine in LPCVD-SiO2.

減圧化学蒸着SiO2膜中塩素の除去
Author (1)：
KEMLAGE B M

About KEMLAGE B M


Material：
IBM Technical Disclosure Bulletin  (IBM Tech Disclosure Bull)

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Volume： 23  Issue： 5  Page： 1879  Publication year： Oct. 1980 
JST Material Number： E0292B  ISSN： 0018-8689  CODEN： IBMTA  Document type： Article
Article type： 解説  Country of issue： United States (USA)  Language： ENGLISH (EN)
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evaporated film

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,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

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Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
減圧化学蒸着

About 減圧化学蒸着

, 
SiO2

About SiO2

, 
塩素

About 塩素


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