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ArticleJ-GLOBAL ID:200902001977715405整理番号:90A0223830

Properties of CVD WSix films and CVD WSix/GaAs Schottky barrier.

CVD‐WSix薄膜およびCVD‐WSix/GaAs Schottky障壁の特性

著者:HARA T(Hosei Univ., Tokyo)、SUGA A(Hosei Univ., Tokyo)、ICHIKAWA R(Hosei Univ., Tokyo)
資料名:Phys Status Solidi A 巻:113 号:2 ページ:459-466
発行年:1989年06月
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