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ArticleJ-GLOBAL ID:200902001979395602整理番号:90A0836964

SiCウイスカーの窒素雰囲気加熱処理 (2)

Heat treatment of SiC whisker under N2 atmosphere. (2).

著者:一ノ関共一(東芝セラミックス 中研)、岩淵研吾(東芝セラミックス 中研)、古田丈人(東芝セラミックス 中研)
資料名:日本セラミックス協会年会講演予稿集 巻:1989 ページ:296
発行年:1989年05月
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