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ArticleJ-GLOBAL ID:200902001983622605整理番号:92A0373225

SiH2Cl2を使ったCVD‐WSi膜の評価

Evaluation of CVD WSix film employing SiH2Cl2.

著者:小山康弘(シャープ)、井上亮三(シャープ)、工藤淳(シャープ)・・・
資料名:半導体・集積回路技術シンポジウム講演論文集 巻:41st ページ:67-72
発行年:1991年12月
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