Evaluation of CVD WSix film employing SiH<sub>2</sub>Cl<sub>2</sub>.

KOYAMA YASUHIRO; INOUE RYOZO; KUDO JUN; SHIBAYAMA HIKO

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J-GLOBAL ID：200902001983622605 Reference number：92A0373225

Evaluation of CVD WSix film employing SiH₂Cl₂.

SiH₂Cl₂を使ったCVD-WSi膜の評価

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Material：
Volume： 41st Page： 67-72 Publication year： Dec. 1991
JST Material Number： F0108B Document type： Proceedings
Article type：原著論文 Country of issue： Japan (JPN) Language： JAPANESE (JA)

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Metallic thin films , Manufacturing technology of solid-state devices

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Evaluation of CVD WSix film employing SiH2Cl2.

Evaluation of CVD WSix film employing SiH₂Cl₂.