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Articleの詳細情報

ArticleJ-GLOBAL ID:200902001993007720整理番号:92A0281597

Void growth as a function of residual stress level in thin, narrow aluminum lines.

著者:KORHONEN M A(Crnell Univ., NY)、BORGESEN P(Crnell Univ., NY)、PASZKIET C A(Crnell Univ., NY)・・・
資料名:Mech Behav Mater Struct Microelectron ページ:413-418
発行年:1991年
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About J-GLOBAL

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