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ArticleJ-GLOBAL ID:200902002010503315整理番号:84A0108495

Fabrication of nanometer metal structures by a combination of techniques of metal evaporation and E-beam nanolithography.

金属蒸着と電子ビームナノリソグラフィー両技術の組合わせによるナノメータ金属構造の製造

著者:LEE K L(Cambridge Univ.)、AHMED H(Cambridge Univ.)
資料名:IEEE Electron Device Lett 巻:4 号:7 ページ:243-245
発行年:1983年07月
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J-GLOBAL: Linking, Expanding and Sparking

About J-GLOBAL

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J-GLOBAL links information that represents the key to research and development. For example, linking articles and patents with people (authors and inventors) enables the extraction of a sequence of information.
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Expanding

The system enables searches of similar kinds of content through linkage with external sites.
It helps you to obtain knowledge from dissimilar fields and discover concepts that cross the boundaries of specialisms.

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