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ArticleJ-GLOBAL ID:200902002033422568整理番号:88A0529604

特集:パターン作成工程の不良改善 フォトレジスト(ドライフィルム)とその効果的使用法

Special issue: Improvement of fault of the pattern generation process. Photo resist (dry film) and its effective utilization method.

著者:佐藤次郎(旭化成工業)、吉岡隆(旭化成工業)、藤川昇(旭化成工業)・・・
資料名:電子技術 巻:30 号:13 ページ:57-63
発行年:1988年09月
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J-GLOBAL: Linking, Expanding and Sparking

About J-GLOBAL

Linking

J-GLOBAL links information that represents the key to research and development. For example, linking articles and patents with people (authors and inventors) enables the extraction of a sequence of information.
It’s useful for making new discoveries and uncovering new information.

Expanding

The system enables searches of similar kinds of content through linkage with external sites.
It helps you to obtain knowledge from dissimilar fields and discover concepts that cross the boundaries of specialisms.

Sparking

Through repeated linkage and expansioniteration, J-GLOBAL provides unexpected hints for problem-solving and the illumination of new ideas.