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J-GLOBAL ID:200902002035388073   Reference number:88A0402421

Optical profile analysis of diffused and ion-implanted silicon.

拡散およびイオン注入したけい素の光学的プロファイル解析
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Volume: 105  Issue:Page: 627-635  Publication year: Feb. 1988 
JST Material Number: D0774A  ISSN: 0031-8965  Document type: Article
Article type: 原著論文  Country of issue: Germany, Federal Republic of (DEU)  Language: ENGLISH (EN)
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Irradiational changes semiconductors  ,  Optical properties of condensed matter in general 
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