Art
J-GLOBAL ID：200902002070873189   Reference number：83A0295551

Multiple endpoint detection system for E-beam resist endpoint.

電子ビーム露光レジスト端点のための多重端点検出システム
Author (2)：
FATULA J J JR

About FATULA J J JR

(IBM Corp.)

About IBM Corp.

, 
WILBARG R R

About WILBARG R R

(IBM Corp.)

About IBM Corp.


Material：
IBM Technical Disclosure Bulletin  (IBM Tech Disclosure Bull)

About IBM Technical Disclosure Bulletin


Volume： 25  Issue： 9  Page： 4812-4815  Publication year： Feb. 1983 
JST Material Number： E0292B  ISSN： 0018-8689  CODEN： IBMTA  Document type： Article
Article type： 解説  Country of issue： United States (USA)  Language： ENGLISH (EN)
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circuit pattern generation

About circuit pattern generation

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Measurement,testing and reliability of solid-state devices 
(NC03040G)

About Measurement,testing and reliability of solid-state devices

,  Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
電子ビーム露光

About 電子ビーム露光

, 
レジスト

About レジスト

, 
多重

About 多重

, 
検出システム

About 検出システム


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