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J-GLOBAL ID:200902002083628817   Reference number:90A0666720

Molecular theory on growth rate of films produced by the low-pressure CVD method.

減圧CVD法による膜形成の分子論的研究
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Volume:Page: 39-48  Publication year: Mar. 1990 
JST Material Number: F0344B  ISSN: 0916-2860  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Vapor plating 
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