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ArticleJ-GLOBAL ID:200902002094042997整理番号:91A0740163

C‐V法によるSOI膜厚と不純物濃度の評価

Estimation of the SOI Film Thicknesses and Impurity Density by C-V method.

著者:山崎博(富士通研)、安藤知史(富士通研)、土屋真平(富士通研)
資料名:電子情報通信学会大会講演論文集 巻:1991 号:Shuki Pt 5 ページ:5.75
発行年:1991年09月
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